IRG-2D_Nano CEM and OSU

Patterning expertise at OSU. (top left) STM image of ‘CEM’ using 34 Co adatoms on Cu(111). (bottom left) AFM image of pattern fabricated by dip pen masking of polyethylene glycol on MoS2. (right) SEM image of SNAP-patterned 15 nm Si wires with 60 nm Pt electrodes. 316